Advanced Process Control in equipments or for a group of equipments

Traditional APC implementations are generally run-to-run (R2R) solutions.. R2R means the results of a process or process step are evaluated and the results obtained only take effect in the next process or process step. A distinction is made between two variants:

APC Forward Loop
The results of a technological process are measured and evaluated and affect the parameters of subsequent process steps.

APC Backward Loop
The results of a technological process are measured and evaluated and affect previous process steps for succeeding jobs.

A combination of forward and backward loop is also possible.

Insitu-APC
Insitu-APC can be used for feedback within complex process equipment or groups of equipment. The most important prerequisite for this is continuous measurement of the process-relevant variables within the process.
Control Model

This requires an Insitu-APC Framework which uses high-performance interfaces such as EDA and OPC to continuously capture measuring and process values. The data mining and SPC modules incorporated into the framework are used to determine the dependencies and derive control parameters. This information is used to determine and implement a special technology-specific APC control scheme.
In conjunction with module adapters, recipe management, simulation, archiving and other components, the APC Framework offers the only current means of affecting discontinuous, quasi-continuous as well as continuous processes while they are running.

APC Framework

Insitu-APC is being developed in a currently ongoing development project (funded by the Sächsischen AufbauBank), in which the indicated requirements are implemented together with practical partners using the most modern software technologies. The complete Framework will be available by the end of 2005. Custom solutions can of course be installed in the meantime.

Ad-hoc information:
The AIS is becoming part of
the Roth & Rau concern

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